Landolt-Börnstein - Group III Condensed Matter

1.7.7.1 Threshold energy for sputtering

Abstract

This chapter discusses production of atomic defects in metallic glasses, and surface effects. Initial damage rates Δρ/Δφt and saturation resistivities ρs of amorphous materials (a) are compared to crystalline materials (c) in a table. It is concluded that amorphous metals show about equal displacement threshold energies and equal recombination volumes as crystalline metals, but larger damage rate transients and lower defect resistivities. Collision processes near the surface effects can be directly studied in sputtering experiments, i.e. by investigating the removal of surface atoms by energetic particle bombardment. The basic processes contributing to sputtering are essentially the same as in the production of atomic defects in the bulk. The threshold energy for sputtering Eth is less than the displacement energy Td. Parameters for the sputtering yield at normal incidence are tabulated in this chapter.

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About this content

Title
1.7.7.1 Threshold energy for sputtering
Book Title
Atomic Defects in Metals
In
1.7.7 Surface effects
Book DOI
10.1007/b37800
Chapter DOI
10.1007/10011948_20
Part of
Landolt-Börnstein - Group III Condensed Matter
Volume
25
Editors
  • H. Ullmaier
Authors
  • P. Jung

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